1. Appearance: Single tube vertical, heated
2. Silicon wafer size: 156 * 156 square/quasi square
3. Working temperature range: 400-1200 ℃
4. Length of constant temperature zone: ≥ 300mm, capable of loading 10 156 * 156 square silicon wafers at a time, back-to-back loading mode, equipped with Shiyingzhou
5. Accuracy of constant temperature zone: ± 0.5 ℃/300mm
6. Gas system: Three way gas system, using imported MKS mass flow meters, pneumatic valves, and other imported components
7. Temperature control system: PLC+touch screen programmable control mode, automatic and manual can be easily switched. The temperature control system adopts imported temperature controller, and the temperature and flow are automatically adjusted according to the process
8. Diffusion method: The equipment is equipped with a vacuum system and supports negative pressure diffusion method
9. Exhaust gas treatment: The equipment is equipped with an exhaust gas treatment system, which uses a solution to absorb harmful components in the exhaust gas
10. Cooling system: The equipment is equipped with a cold water system to protect the sealing device and cool the heater housing
11. Alarm and protection: Automatic alarm and protection for overheating, disconnection, water shortage, and vacuum abnormalities in the system
