The wafer vacuum annealing furnace is mainly used for low-temperature annealing of semiconductor wafers in high vacuum environments.
Size: 4-8 inch wafer
Wafer Boat: Standard 25 pieces
Temperature control accuracy: ± 3 ℃
Heating rate: 10 ℃/min
Cleanliness level: Class 100 cleanliness
Vacuum degree: 5 * 10-4 Pa
Operating temperature: 200-550 degrees Celsius
